
Thirty years have passed since the very first results of EUV imaging were made public by Kinoshita and co-workers of NTT Japan. Why does it take this long for EUVL to develop from infancy to near maturity? First, there was still quite a bit of headroom left in optical lithography back then, making the switch to a next-generation lithography technology less urgent, until now. Second, technological barriers that had to be surmounted in order to put EUVL in high-volume manufacturing have indeed been high. In this presentation, I will review the early history of EUVL, point out how its life was extended beyond the initial phase of promising results, and present some most recent progress on the performance of its exposure tools, technology infrastructure, and patterning capability, and hopefully convince the audience that the technology is crossing the threshold to become a mainstream patterning technology for sub-10-nm generations of integrated circuits.
This content is restricted to our MIG members and members of the MIT community. Please login or contact us for more information about our partner programs.