Extending the Era of Moore’s Law
MTL Seminar Series
Tsu-Jae King Liu, UC Berkeley
Speaker
Abstract
As the minimum feature size of an integrated circuit has been scaled down well below the wavelength of light used in the photolithographic process, the semiconductor industry has faced a growing challenge of continuing to increase the density of transistors at ever lower cost per transistor. This talk will describe a cost-effective method for defining sub-lithographic features, to help extend the era of Moore’s Law.
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